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Ondo Beauty 36.5 HYALURONIC ACID & ALGAE MOISTURE boosting mask

Face mask

Expected delivery:
Tuesday 7/2/2024
Tuesday 7/2/2024

*Approximate for orders whose destination is the provincial capital. In other cases there will be a delay of 1 day.

HYALURONIC ACID & ALGAE MOISTURE boosting mask by ONDO BEAUTY 36.5

"Chok-Chok" is a popular Korean word that describes radiant and highly hydrated skin. This biodegradable fabric mask is ideal for those with dehydrated skin who want to highlight luminosity and achieve the Korean glass skin effect.

The stimulating hyaluronic acid and seaweed mask contains 88% witch hazel, the main active ingredient to soothe the skin, cleanse and minimize enlarged pores.

The Marine Plant Complex with 7 types of algae extracts and Marine Narcissus (marine plant), enriches the skin with vital nutrients.

Niacinamide, a derivative of vitamin B3, soothes, brightens the skin and prevents the appearance of dark spots.

Aquaxyl helps optimize the skin's hydration flow, controls circulation and water reserves, providing an “anti-dehydration shield” action with visible effects in 8 hours.

Age
From 26 until More of 50 years
Skin type
All skin types
Format
Patch
Green beauty
Cruelty Free Vegan
Ingredients
Hyaluronic acid
EAN
8437016160039
Age
From 26 until More of 50 years
Skin type
All skin types
Format
Patch
Green beauty
Cruelty Free Vegan
Ingredients
Hyaluronic acid
ingredients
hamamelis virginiana (witch hazel) water, glycerin, dipropylene glycol, niacinamide, 1,2-hexanediol, sea water, macrocystis pyrifera (kelp) extract, gelidium cartilagineum (red algae) extract, laminaria japonica (brown algae) extract, codium tomentosum extract, ecklonia cava extract, enteromorpha compressa extract, zostera marina extract, pancratium maritimum extract, sodium hyaluronate, xylitol, xylitylglucoside, anhydroxylitol, allantoin, magnesium pca, zinc pca, sodium pca, tocopherol, citrus aurantium bergamia (bergamot) fruit oil, rosmarinus officinalis (rosemary) leaf oil, betaine, aqua (water/eau), butylene glycol, caprylyl glycol, pentylene glycol, polyglyceryl-10 laurate, sodium phytate, xanthan gum, ethylhexylglycerin, carbomer, tromethamine, limonene*. *naturally occurring in essential oils.
The lists of ingredients contained in the composition of the products are updated regularly. Check the ingredient list on the packaging before using the product.
  1. Apply to clean face and remove after 10-15 minutes.
  2. Once removed, massage the remainder into the skin until completely absorbed.
  3. Do not rinse.
  4. Chok Chok mask can be used to prepare the skin for makeup as it helps improve skin texture.

Ondo Beauty 36.5 - HYALURONIC ACID & ALGAE MOISTURE boosting mask - Reviews

Ondo Beauty 36.5 - HYALURONIC ACID & ALGAE MOISTURE boosting mask - FAQ

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